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Incubation effect during laser micromachining of GaN films with femtosecond pulses.
ALMEIDA, Gustavo Foresto Brito de; NOLASCO, Lucas Konaka; BARBOSA, Gustavo Rocha; SCHNEIDER, A.; JAROS, A.; CLAVERO, I. Manglano; MARGENFELD, C.; WAAG, A.; VOSS, T.; MENDONÇA, Cleber Renato.
Abstract: We studied the evolution of the incubation effect during fs-laser micromachining of gallium nitride films with the number of laser pulses applied per sample surface area. The damage threshold fluence was measured using the zero-damage method and reduced from (0.61 ± 0.01) J/cm2 to (0.05 ± 0.03) J/cm2 when increasing the number of applied laser pulses from single-shot excitation to 105 pulses per spot, respectively. By applying the exponential defect accumulation model to the experimental incubation data, we determined a small value for the incubation parameter of (0.011 ± 0.001), indicating that gallium nitride has slow incubation dynamics. This information is important to achieve the desired control and high efficiency of fs-laser processing of gallium-nitride-based samples.
Journal of Materials Science
v. 30, n. 18, p. 16821-16826 - Ano: 2019
Fator de Impacto: 3,442
http://dx.doi.org/10.1007/s10854-019-01373-2
    @article={002967426,author = {ALMEIDA, Gustavo Foresto Brito de; NOLASCO, Lucas Konaka; BARBOSA, Gustavo Rocha; SCHNEIDER, A.; JAROS, A.; CLAVERO, I. Manglano; MARGENFELD, C.; WAAG, A.; VOSS, T.; MENDONÇA, Cleber Renato.},title={Incubation effect during laser micromachining of GaN films with femtosecond pulses},journal={Journal of Materials Science},note={v. 30, n. 18, p. 16821-16826},year={2019}}